Basic Info.
Transport Package
Cleaning and Final Packaging - Cleaned for Use in
Specification
Diameter <= 14 inch, Thickness >= 1mm
Product Description
Nickel Vanadium Sputtering Targets
Nickel Vanadium Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Nickel Vanadium Sputtering Targets
Applications• Semiconductor • Chemical Vapor Deposition (CVD) • Physical Vapor Deposition (PVD) | Features• Competitive pricing • High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process• Refining Three-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment | Options• 99.9% minimum purity • Smaller sizes also available for R&D applications • Sputtering target bonding service |
Related Products of Nickel Vanadium Sputtering Targets
Pure Metal Sputtering Targets Nickel Sputtering Target Vanadium Sputtering TargetNickel Sputtering Target Rotatable Nickel Sputtering Target Planar Nickel Sputtering Target | Alloy Sputtering Targets Nickel Vanadium Sputtering Target Rotatable Nickel Vanadium Sputtering Target Planar Nickel Vanadium Sputtering Target Nickel Aluminum Sputtering Target Nickel Chromium Sputtering Target Nickel Chromium Aluminum Silicon Sputtering Target Nickel Iron Sputtering Target Nickel Molybdenum Sputtering Target Nickel Titanium Sputtering Target Permalloy Sputtering TargetNickel Aluminum Sputtering Target Nickel Chromium Sputtering Target Nickel Chromium Aluminum Silicon Sputtering Target Nickel Iron Sputtering Target Nickel Molybdenum Sputtering Target Nickel Titanium Sputtering Target Nickel Vanadium Sputtering Target Permalloy Sputtering Target | Ceramic Sputtering Targets Nickel Ferrite Sputtering TargetNickel Oxide Sputtering Target Praseodymium Nickel Oxide Sputtering Target Vanadium Oxide Sputtering TargetEuropium Nickel Oxide Sputtering Target Lanthanum Nickel Oxide Sputtering Target Lithium Nickel Cobalt Oxide Sputtering Target Lithium Nickel Phosphate Sputtering Target Neodymium Nickel Oxide Sputtering Target Nickel Oxide Sputtering Target |
Evaporation Materials Nickel Evaporation PelletVanadium Evaporation Pellet Nickel Chromium Evaporation Pellet Nickel Iron Evaporation Pellet Nickel Antimony Evaporation Pellet Nickel Chromium Evaporation Pellet Permalloy Evaporation PelletNickel Pellet Nickel Chromium Alloy Pellet Nickel Iron Pellet Nickel Antimony Pellet Nickel Chromium Pellet Permalloy Alloy Pellet Vanadium Pellet | Metal Vanadium Wire Vanadium Rod Vanadium Foil Vanadium Pellet Vanadium Pieces Vanadium Ingot Vanadium Oxide | Metal Powders Nickel PowderNickel Alloy Powder Nickel Coated Tungsten Carbide Powder Spherical Nickel Based Alloy PowderNickel Powder Nickel Metal powder Nickel Alloy Powder Spherical Nickel PowderVanadium Carbide Sputtering TargetVanadium Powder Vanadium Carbide Powder |
Address:
Rm. 408, Building 1, No. 31, Yinshan Road Yuelu District, Changsha, Hunan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals, Manufacturing & Processing Machinery
Management System Certification:
ISO 9001, ISO 9000
Company Introduction:
Changsha Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc.