Basic Info.
Specification
Length <= 32 inch, Width <= 12 inch, Thickness >=
Product Description
Material Type | Indium Tin Oxide |
Symbol | In2O3/SnO2 90/10 wt %, ITO |
Melting Point (°C) | 1,800 |
Sputter | RF, DC |
Max Power Density* (Watts/Square Inch) | 20 |
Type of Bond | Indium, Elastomer |
Indium tin oxide (ITO, In2O3/SnO2 90/10 WT%) is a ternary composition of Indium, Tin, and Oxygen in varying proportions. Depending on the oxygen content, it can either be described as a ceramic or alloy. Indium tin oxide is typically encountered as an oxygen-saturated composition with a formulation of 74% In, 18% O2, and 8% Sn by weight. Oxygen-saturated compositions are so typical that unsaturated compositions are termed oxygen-deficient ITO. It is transparent and colorless in thin layers, while in the bulk form, it is yellowish to grey. ITO is among the most heavily utilized compounds in the thin film industry due to its electrical conductivity and optical transparency. It is evaporated or sputtered under vacuum to generate transparent conductive layers in LCDs manufacturing and various optical coatings. Thin films of ITO are created for the development of sensors and a glass coating for the automotive industry.
Indium Tin Oxide (ITO) sputtering target is widely used to form electrically transparent thin films. These films adopt direct current magnetron sputtering processes for electrodes in flat panel displays, solar cells, gas sensors, and so on. ITO sputtering target requires high purity, homogeneous microstructure, high density, and high electrical conductivity to improve ITO thin film property. ITO sputtering targets are being fabricated using In2O3-SnO2 mixed powders and tin-doped indium oxide powders.
ITO Sputtering Targets Information
Indium Tin Oxide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm;
Types: Planar sputtering targets, Rotary sputtering targets.
Target Bonding Service is recommended for these ITO targets. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
Recycle of ITO Sputtering Targets
The remaining material is unusable in the sputtering process. In the case of an ITO sputtering target, the unused portion can contain a significant amount of indium. It makes sense to reclaim or recycle as much of the target as possible. The target user will break up the remaining target into chunks. The chunk ITO is sent to a recycling/reclaim center where the chunk ITO is converted back into indium metal. And the cycle starts all over again.
More Information on ITO Sputtering Targets
Applications• FPD, Touch panel, Solar cells, LED • Semicoductor• Special glass, Freezer glass • Precision optics | Features• High purity and high density • Custom sizes available • Good roughness of target surface and low particle • Experienced application technolohy team |
Manufacturing Process• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate• Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants Protection during shipment | Options• 99.99% minimum purity• Planar, Rotary, Slug avaliable • Variety composition such as 90/10,93/7,95/5,97/3,98/2 etc. |
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Address:
Rm. 408, Building 1, No. 31, Yinshan Road Yuelu District, Changsha, Hunan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals, Manufacturing & Processing Machinery
Management System Certification:
ISO 9001, ISO 9000
Company Introduction:
Changsha Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc.