Basic Info.
Specification
Circular: Diameter <= 14 inch, Thickness >= 1mm
Product Description
| Material Type | Titanium |
| Symbol | Ti |
| Atomic Weight | 47.867 |
| Atomic Number | 22 |
| Color/Appearance | Silvery Metallic |
| Thermal Conductivity | 21.9 W/m.K |
| Melting Point (°C) | 1,660 |
| Coefficient of Thermal Expansion | 8.6 x 10-6/K |
| Theoretical Density (g/cc) | 4.5 |
| Z Ratio | 0.628 |
| Sputter | DC |
Max Power Density*
(Watts/Square Inch) | 50 |
| Type of Bond | Indium, Elastomer |
| Comments | Alloys with W/Ta/Mo; evolves gas on first heating. |
Titanium is a strong metal with low density that is quite ductile (especially in an oxygen-free environment). The relatively high melting point (more than 1,650ºC or 3,000ºF ) makes it useful as a refractory metal. It is paramagnetic and has relatively low electrical and thermal conductivity. Titanium Sputtering Targets are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. It is one of the core materials for preparing integrated circuits, and purity usually requires over 99.99%. AEM offers Titanium alloy targets such as Tungsten Titanium (W/Ti 90/10 wt%) Sputtering Target, an essential material for the semiconductor and solar industry. The W/Ti sputtering target density can reach over 14.24 g/cm3, and the purity can reach 99.995%.
Titanium Sputtering Targets Information
Titanium Sputtering Targets
Purity: 99.9-99.999%
Circular: Diameter <= 14 inch, Thickness >= 1mm
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target
Titanium Sputtering Targets Analysis
AEM Deposition manufacture Titanium Sputtering Targets with high purity. The highest purity can reach to 99.999%. The analytical methods we use includes:
1. Metallic elements analyze using ICP-OES.
2. Gas elements analyze using LECO.
More Information on Titanium Sputtering Targets
Applications• Decorative coating
• Hardware tool coating
• Semiconductor
• Flat panel displays | Features• Competitive pricing
• High purity
• Grain refined, Engineered microstructure
(average grain size < 20 um)
• Semiconductor grade |
Manufacturing Process• Melting (EB-Electron Beam Melting)
• Analysis
• Casting & Grain refinement
Forging, Rolling, Annealing, Micrography, Machining
• Cleaning and final packaging - Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment | Options• 99.9% minimum purity
• Semiconductor grade titanium alloys available
Ti/Al, W/Ti 90/10 wt%)
• Smaller sizes also available for R&D applications
• Sputtering target bonding service |
Related Products of Titanium Sputtering Targets
Pure Metal Sputtering Targets
Titanium Sputtering Target Rotatable Titanium Sputtering Target Planar Titanium Sputtering Target | Alloy Sputtering Targets
Nickel Titanium Sputtering Target Tungsten Titanium Sputtering Target | Ceramic Sputtering Targets
LaTiO3 Sputtering TargetPZT Sputtering Target Lithium Titanate Sputtering Target Strontium Titanate Sputtering Target Titanium Dioxide Sputtering Target Titanium Monoxide Sputtering Target Titanium Boride Sputtering Target Titanium Carbide Sputtering Target Titanium Disilicide Sputtering Target Titanium Nitride Sputtering Target |
Evaporation Materials
Titanium Evaporation PelletTitanium Dioxide Evaporation Pellet Titanium Monoxide Evaporation Pellet | Crucibles
Intermetallic Crucible (BN-TiB2) | Metal Powders
Titanium Powder
Spherical Titanium PowderTitanium Alloy Powder |
Address:
Rm. 408, Building 1, No. 31, Yinshan Road Yuelu District, Changsha, Hunan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals, Manufacturing & Processing Machinery
Management System Certification:
ISO 9001, ISO 9000
Company Introduction:
Changsha Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc.
