Basic Info.
Shape
Sheet, Square, Round
Certification
TUV, ISO, CE
Specification
Circular: Diameter <= 14inch, Thickness >= 1mm.
Product Description
Material Type | Copper |
Symbol | Cu |
Atomic Weight | 63.546 |
Atomic Number | 29 |
Color/Appearance | Copper, Metallic |
Thermal Conductivity | 400 W/m.K |
Melting Point (°C) | 1,083 |
Coefficient of Thermal Expansion | 16.5 x 10-6/K |
Theoretical Density (g/cc) | 8.92 |
Z Ratio | 0.437 |
Sputter | DC |
Max Power Density* (Watts/Square Inch) | 200 |
Type of Bond | Indium, Elastomer |
Comments | Adhesion poor. Use interlayer (Cr). Evaporates using any source material. |
General of Copper
Copper is a ductile metal with very high thermal conductivity, electrical conductivity, ductility, corrosion resistance. A freshly exposed surface of pure copper has a reddish-orange color. High-purity copper is used as various wires in the electronics industry, bonding wires for electronic packaging, high-quality audio cables and integrated circuits, liquid crystal display sputtering targets, and ion plating. It is also an indispensable valuable material in atomic energy, rockets, missiles, aviation, space navigation, and metallurgical industries. AEM can provide high purity OFC, Cupronickel and alloy products as you requested.
Material Notes of Copper Sputtering Targets
Purity: 99.99-99.9999%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target
Analysis of Copper Sputtering Targets
AEM Deposition manufacture copper sputtering targets with high purity, the highest purity can reach to 99.9999%. The significant benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. The analytical methods we use includes:
1. Metallic elements were analyzed using ICP-OES.
2. Gas elements were analyzed using LECO.
Below form is a Certificate of Analysis (COA) for 99.999% high purity Copper Sputtering Target:
Other Information of Copper Sputtering Targets
Applications • Electronics • Semiconductor • Flat panel displays | Features • Competitive pricing • High purity and density • Grain refined, engineered microstructure ( the average grain size < 50 um) • Semiconductor grade |
Manufacturing Process • Melting and casting Electrical resistance furnace - Semi-continuous casting (VIM&EB) • Grain refinement Thermomechanical treatment (Forging, Rolling, Annealing) • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment | Options • 99.99% minimum purity • Semiconductor grade copper alloys targets Cu/Zn 50/50 wt%, Al/Si/Cu, Al/Cu, Au/Cu, Cu/Ag 84:16 wt%, Cu2Te, • Semiconductor grade copper compound targets CuS, Cu2S, SrCuO2, Sm(1-x)CexCuO4, Nd2CuO4, La(1-x)SrxCuO4, La2CuO4, La2CuMnO6, SmCuO4 and Sm2CuOx, CuO, Cu2O, CuAlO2, CIGS, Cu2Se • Sputtering target bonding service |
More about Copper Sputtering Target products please visit the url:
https://www.made-in-china.com/showroom/aemuser
Address:
Rm. 408, Building 1, No. 31, Yinshan Road Yuelu District, Changsha, Hunan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals, Manufacturing & Processing Machinery
Management System Certification:
ISO 9001, ISO 9000
Company Introduction:
Changsha Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc.