Basic Info.
Transport Package
Cleaning and Final Packaging - Cleaned for Use in
Specification
Diameter <= 14 inch, Thickness >= 1mm;
Product Description
| Material Type | Copper |
| Symbol | Cu |
| Atomic Weight | 63.546 |
| Atomic Number | 29 |
| Color/Appearance | Copper, Metallic |
| Thermal Conductivity | 400 W/m.K |
| Melting Point (°C) | 1,083 |
| Coefficient of Thermal Expansion | 16.5 x 10-6/K |
| Theoretical Density (g/cc) | 8.92 |
| Z Ratio | 0.437 |
| Sputter | DC |
Max Power Density*
(Watts/Square Inch) | 200 |
| Type of Bond | Indium, Elastomer |
| Comments | Adhesion poor. Use interlayer (Cr). Evaporates using any source material. |
Copper is a ductile metal with very high thermal conductivity, electrical conductivity, ductility, corrosion resistance. A freshly exposed surface of pure copper has a reddish-orange color. High-purity copper is used as various wires in the electrical and electronics industry, bonding wires for electronic packaging, high-quality audio cables and integrated circuits, liquid crystal display sputtering targets, and ion plating. It is also an indispensable valuable material in atomic energy, rockets, missiles, aviation, space navigation, and metallurgical industries. AEM offers high purity OFC, Cupronickel, and alloy products as per requirement.
Copper Sputtering Targets Information
Copper Sputtering Targets
Purity: 99.99-99.9999%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm;
Targets Type: Planar sputtering target, Rotary sputtering target.
Copper Sputtering Targets Analysis
AEM Deposition manufacture copper sputtering targets with high purity. The highest purity can reach to 99.9999%. The significant benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. The analytical methods we use includes:
1. Metallic elements were analyzed using ICP-OES.
2. Gas elements were analyzed using LECO.
Below form is a Certificate of Analysis (COA) for 99.999% high purity Copper Sputtering Target:
More Information on Copper Sputtering Targets
Applications• Electronics
• Semiconductor
• Flat panel displays | Features• Competitive pricing
• High purity and density
• Grain refined, Engineered microstructure ( the average grain size < 50 um)
• Semiconductor grade |
Manufacturing Process• Melting and casting
Electrical resistance furnace - Semi-continuous casting (VIM&EB)
• Grain refinement
Thermomechanical treatment (Forging, Rolling, Annealing)
• Cleaning and final packaging - Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment | Options• 99.99% minimum purity • Smaller sizes also available for R&D applications • Sputtering target bonding service |
Related Products of Copper Sputtering Targets
Pure Metal Sputtering Targets
Copper Sputtering Target Rotatable Copper Sputtering Target Planar Copper Sputtering Target | Alloy Sputtering Targets
Aluminum Copper Sputtering Target Aluminum Silicon Copper Sputtering Target Copper Silver Sputtering Target Copper Zinc Sputtering Target Gold Copper Sputtering Target | Ceramic Sputtering Targets
Copper Aluminum Oxide Sputtering TargetCopper Oxide Sputtering Target Copper Sulfide Sputtering Target Copper Selenide Sputtering Target Copper Telluride Sputtering Target |
Evaporation Materials
Copper Evaporation PelletCopper Oxide Evaporation Pellet Copper Sulfide Evaporation Pellet Copper Selenium Evaporation Pellet CuInSe2 Evaporation Pellet | Crucibles
Copper Crucible | Metal Powders
Copper PowderElectrolytic Copper powder Water Atomized Copper powder Tin Bronze powder Copper-Tin Alloy Powder Copper -Tin Diffusion Powder |
Address:
Rm. 408, Building 1, No. 31, Yinshan Road Yuelu District, Changsha, Hunan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals, Manufacturing & Processing Machinery
Management System Certification:
ISO 9001, ISO 9000
Company Introduction:
Changsha Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc.
