Basic Info.
Shape
Sheet, Square, Round
Certification
TUV, ISO, CE
Specification
Circular: Diameter <= 14inch, Thickness >= 1mm.
Product Description
Material Type | Chromium |
Symbol | Cr |
Atomic Weight | 51.9961 |
Atomic Number | 24 |
Color/Appearance | Silvery, Metallic |
Thermal Conductivity | 94 W/m.K |
Melting Point (°C) | 1,857 |
Coefficient of Thermal Expansion | 4.9 x 10-6/K |
Theoretical Density (g/cc) | 7.2 |
Z Ratio | 0.305 |
Sputter | DC |
Max Power Density* (Watts/Square Inch) | 80 |
Type of Bond | Indium, Elastomer |
Comments | Films very adherent. High rates possible. |
General
Chromium is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium sputtering targets are widely used in hardware tool coating, decorative coating and Flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping, ...).The thickness of the film is generally 2~10um, and the film requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion porperty. Now, chromium sputtering targets are common applicated in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
Material Notes
Purity: 99.5-99.95%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target, Acr cathode
Analysis of Chromium Sputtering Targets
AEM Deposition manufacture chromium sputtering targets with high purity, the highest purity can reach to 99.95%. The analytical methods we use includes:
1. Metallic elements were analyzed using ICP-OES.
2. Gas elements were analyzed using LECO.
Below picture is a Metallographic diagram of Chromium Sputtering Target:
Other Information of Chromium Sputtering Targets
Applications • Decorative coating • Hardware tool coating • Glass coating • Flat panel displays | Features • Competitive pricing • High purity and density • Hot isostatic pressing (HIP) process • Grain refined, engineered microstructure (average grain size 60-70 um) • Semiconductor grade |
Manufacturing Process • Powder preparation • Hot isostatic pressing • Analysis • Grain refinement Annealing, micrography, machining • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment | Options • 99.5% minimum purity • Semiconductor grade chromium compound targets CrO3, Ni/Cr/Al/Si (54-37-6-3 wt%), CrSiO2, Cr2O3, CrN, Ni/Cr, CrSi2, CrSi • Sputtering target bonding service | |
More about Chromium Sputtering Target products please visit the url:
https://www.made-in-china.com/showroom/aemuser
Address:
Rm. 408, Building 1, No. 31, Yinshan Road Yuelu District, Changsha, Hunan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals, Manufacturing & Processing Machinery
Management System Certification:
ISO 9001, ISO 9000
Company Introduction:
Changsha Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc.