Basic Info.
Product Description
Indium Phosphide Wafer
Indium phosphide (InP) is an important compound semiconductor material with the advantages of high electronic limit drift speed, good radiation resistance, and good thermal conductivity. The materials are very suitable for manufacturing high frequency, high speed, high power microwave devices, and integrated circuits. It's widely used in solid-state lighting, microwave communication, fiber-optic communication, solar cells, guidance/navigation, satellite, and other civil fields.
Indium Phosphide Wafer Physical Properties
Material | InP |
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Growth Method | LEC,VCZ/P-LEC , VGF, VB |
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Lattice (A) | a=5.869 |
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Structure | M3 |
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Melting Point | 1600ºC |
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Density(g/cm3) | 4.79 g/cm3 |
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Doped Material | Undoped S-doped Zn-doped Fe-doped |
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Type | N N P N |
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Carrier Concentration (cm-3) | (0.4-2) x 1016 (0.8-3) x 1018 (4-6) x 1018 (0.6-2) x 1018 107-108 |
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Mobility (cm2v-1s-1) | (3.5-4) x 103 (2.2-2.4) x 103 (1.3-1.6) x 103 70-90 ≥2000 |
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EPD (Average) | <5 x 104/cm2 3 x 104/cm2 2 x 103/cm2 2 x 104/cm2 3 x 104/cm2 |
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Indium Phosphide Wafer Specifications
Size | 10 x 10 x 0.35mm, 10 x 5 x 0.35mm, 2'' Dia, 3'' Dia,4' Dia (customized sizes are available) |
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Thickness | 0.35 mm, 0.6 mm |
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Polished | SSP or DSP |
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Orientation | <100>, <111> |
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Redirection Precision | ±0.5° |
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Primary Flat Length | 16±2 mm, 22±2 mm, 32.5±2 mm |
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Scondary Flat Length | 8±1 mm, 11±1 mm, 18±1 mm |
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TTV | <10 um, <15 um |
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Bow | <10 um, <15 um |
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Warp | <15 um |
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Indium Phosphide Wafer Package
Packaged with class 100 clean bag or wafer container in a class 1000 clean room.
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Address:
Rm. 408, Building 1, No. 31, Yinshan Road Yuelu District, Changsha, Hunan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals, Manufacturing & Processing Machinery
Management System Certification:
ISO 9001, ISO 9000
Company Introduction:
Changsha Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc.