Basic Info.
Model NO.
Titanium Sputtering Target
Shape
Sheet, Square, Round
Specification
Circular: Diameter <= 14inch, Thickness >= 1mm
Product Description
Material Type | Titanium |
Symbol | Ti |
Atomic Weight | 47.867 |
Atomic Number | 22 |
Color/Appearance | Silvery Metallic |
Thermal Conductivity | 21.9 W/m.K |
Melting Point (°C) | 1,660 |
Coefficient of Thermal Expansion | 8.6 x 10-6/K |
Theoretical Density (g/cc) | 4.5 |
Z Ratio | 0.628 |
Sputter | DC |
Max Power Density* (Watts/Square Inch) | 50 |
Type of Bond | Indium, Elastomer |
Comments | Alloys with W/Ta/Mo; evolves gas on first heating. |
General
Titanium is a strong metal with low density that is quite ductile (especially in an oxygen-freeenvironment). The relatively high melting point (more than 1,650ºC or 3,000ºF ) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductive. Titanium sputtering targets are common used in hardware tool coating, decorative coating, semicondutor components and Flat display coating. It is one of the core materials for preparing integrated circuits, and the purity usually require over 99.99%. AEM also can provide Titanium alloy targets such as tungsten titanium (W/Ti 90/10 wt%) sputtering target, which is an improtant material for semiconductor and solar industry. The density of W/Ti sputtering target we can reach over 14.24 g/cm3, and the purity can reach to 99.995%.
Material Notes
Purity: 99.9-99.999%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target
Analysis of Titanium Sputtering Targets
AEM Deposition manufacture titanium sputtering targets with high purity, the highest purity can reach to 99.999%. The analytical methods we use includes:
1. Metallic elements were analyzed using ICP-OES.
2. Gas elements were analyzed using LECO.
Other Information of Titanium Sputtering Targets
Applications • Decorative coating • Hardware tool coating • Semiconductor • Flat panel displays | Features • Competitive pricing • High purity • Grain refined, engineered microstructure (Average grain size < 20 um) • Semiconductor grade |
Manufacturing Process • Melting (EB-Electron Beam Melting) • Analysis • Casting & Grain refinement Forging, Rolling, Annealing, Micrography, Machining • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment | Options • 99.5% minimum purity • Semiconductor grade titanium alloys available Ti/Al, W/Ti 90/10 wt%) • Smaller sizes also available for R&D applications • Sputtering target bonding service | |
More about Titanium Sputtering Target products please visit the url:
https://www.made-in-china.com/showroom/aemuser
Address:
Rm. 408, Building 1, No. 31, Yinshan Road Yuelu District, Changsha, Hunan, China
Business Type:
Manufacturer/Factory
Business Range:
Chemicals, Manufacturing & Processing Machinery
Management System Certification:
ISO 9001, ISO 9000
Company Introduction:
Changsha Advanced Engineering Materials Limited (AEM) is an international company involved in the R & D, manufacturing and sales of all kinds of high-tech materials. We provide worldwide research institutes and high-tech enterprises with high purity non-ferrous materials, customized alloys, compounds and almost every kind of complicated synthetic material, etc. We have great advantages in magnetron sputtering targets, vacuum coating materials, high-purity metals, high-purity compounds, rare-earth metals, distilled rare-earth metals, coated substrates, etc.